Improved photoelectrochemical performance of Ti-doped alpha-Fe2O3 thin films by surface modification with fluoride

Yong-Sheng Hu1, Alan Kleiman-Shwarsctein, Galen D Stucky

  • 1Department of Chemical Engineering, University of California at Santa Barbara, Santa Barbara, CA, 93106-5080, USA.

Chemical Communications (Cambridge, England)
|June 18, 2009
PubMed

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