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Related Experiment Video

Updated: Jun 22, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Writing self-erasing images using metastable nanoparticle "inks"

Rafal Klajn¹, Paul J Wesson, Kyle J M Bishop

¹Department of Chemical and Biological Engineering, Department of Chemistry, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208, USA.

Angewandte Chemie (International Ed. in English)

|June 18, 2009

Summary

No abstract available in PubMed .

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