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Updated: Jun 22, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
An angled nano-tunnel fabricated on poly(methyl methacrylate) by a focused ion beam
Eun Kyu Her1, Hee-Suk Chung, Myoung-Woon Moon
1Department of Materials Science and Engineering, Seoul National University, Seoul, Republic of Korea.
Abstract:
Angled nano-scale tunnels with high aspect ratio were fabricated on poly(methyl methacrylate) (PMMA) using a focused ion beam (FIB). The fabrication parameters such as ion fluence, incidence angle, and acceleration voltage of the Ga(+) ion beam were first studied on the PMMA surface to explore the formation of the nano-scale configurations such as nano-holes and cones with diameter in the range of 50-150 nm at an ion beam acceleration voltage of 5-20 kV. It was also found that the PMMA surface exposed to FIB was changed into an amorphous graphitic structure. Angled nano-scale tunnels were fabricated with high aspect ratio of 700-1500 nm in depth and 60 nm in mean diameter at an ion beam acceleration voltage of 5 kV and under a specific ion beam current. The angle of the nano-tunnels was found to follow the incident angle of the ion beam tilted from 0 degrees to 85 degrees , which has the potential for creating a mold for anisotropic adhesives by mimicking the hairs on a gecko's feet.

