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Biasing of Metal-Semiconductor Junctions01:27

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Scalable Quantum Integrated Circuits on Superconducting Two-Dimensional Electron Gas Platform
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Very large scale integration of nanopatterned YBa2Cu3O7-delta Josephson junctions in a two-dimensional array.

Shane A Cybart1, Steven M Anton, Stephen M Wu

  • 1Department of Physics, University of California, Berkeley, California 94720, USA. scybart@berkeley.edu

Nano Letters
|September 16, 2009
PubMed
Summary

Researchers achieved large-scale integration of Josephson junctions using ion irradiation and a nanofabricated mask. This method successfully created 15,820 junctions in a YBCO film, showing promising uniformity for superconducting electronics.

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Area of Science:

  • Superconducting electronics
  • Materials science
  • Nanofabrication

Background:

  • Josephson junctions are key components in superconducting electronics.
  • Achieving large-scale integration of these junctions is crucial for advancing quantum computing and sensitive detectors.
  • Previous methods faced challenges in uniformity and scalability.

Purpose of the Study:

  • To demonstrate a novel method for fabricating large-scale, two-dimensional series-parallel arrays of Josephson junctions.
  • To assess the uniformity and characteristics of the integrated Josephson junctions.

Main Methods:

  • Utilized electron beam lithography and reactive ion etching to create a high-aspect-ratio nanofabricated mask with 35 nm wide slits.
  • Employed ion irradiation through the mask to selectively pattern YBa(2)Cu(3)O(7-delta) (YBCO) films, forming Josephson junctions.
  • Characterized the critical current (I(ck)) of individual parallel segments, each containing 28 junctions.

Main Results:

  • Successfully fabricated a two-dimensional series-parallel array with 15,820 Josephson junctions.
  • YBCO film patterning was precisely controlled by the 35 nm slits in the mask.
  • A standard deviation of approximately 16% was observed in the critical current (I(ck)) across parallel segments, indicating good uniformity.

Conclusions:

  • Ion irradiation through a precisely nanofabricated mask is an effective technique for large-scale integration of Josephson junctions.
  • The demonstrated method offers a scalable pathway for producing uniform Josephson junction arrays for advanced superconducting devices.
  • The achieved integration density and uniformity pave the way for practical applications in quantum technologies.