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Evaluating Plasmonic Transport in Current-carrying Silver Nanowires

Evaluating Plasmonic Transport in Current-carrying Silver Nanowires

Published on: December 11, 2013

Plasmonic interference nanolithography with a double-layer planar silver lens structure.

Beibei Zeng¹, Xufeng Yang, Changtao Wang

¹State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China.

|September 23, 2009

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We developed a new surface plasmon interference lithography technique using a double-layer silver lens. This method achieves high-contrast patterns and offers a theoretical resolution limit of 1/12 wavelength for advanced nanofabrication.

Area of Science:

Nanotechnology
Optics
Materials Science

Background:

Surface plasmon interference lithography (SPIL) is a key technique for nanoscale patterning.
Existing SPIL methods face challenges in achieving high contrast and structural simplicity.

Purpose of the Study:

To introduce a novel SPIL method utilizing a double-layer planar silver lens.
To demonstrate the feasibility and advantages of this new lithography scheme.

Main Methods:

Implementation of a double-layer planar silver lens for SPIL.
Rigorous coupled wave analysis (RCWA) with practical parameters to validate the scheme.
Analysis of factors influencing interference pattern quality.

Main Results:

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Related Experiment Videos

Last Updated: Jun 20, 2026

Evaluating Plasmonic Transport in Current-carrying Silver Nanowires

Evaluating Plasmonic Transport in Current-carrying Silver Nanowires

Published on: December 11, 2013

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Published on: July 21, 2018

Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle

Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle

Published on: January 3, 2016

The proposed method generates interference patterns with sufficient contrast for lithography.
A simple structure facilitates convenient fabrication.
Identified three key factors determining the resolution of interference patterns.

Conclusions:

The double-layer planar silver lens SPIL method is a viable and effective technique.
Achieved a theoretical resolution limit of approximately 1/12 wavelength.
The method offers a promising approach for high-resolution nanofabrication.