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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Local conductance measurements of double-layer graphene on SiC substrate

M Nagase1, H Hibino, H Kageshima

  • 1NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, 3-1, Morinosato-wakamiya, Atsugi, Kanagawa 243-0198, Japan. nagase@aecl.ntt.co.jp

Nanotechnology
|October 8, 2009
PubMed

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