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Updated: Jun 19, 2026
Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Solution-processed flexible ZnO transparent thin-film transistors with a polymer gate dielectric fabricated by
Chanwoo Yang1, Kipyo Hong, Jaeyoung Jang
1Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang 790-784, Korea.
Abstract:
We report the development of solution-processed zinc oxide (ZnO) transparent thin-film transistors (TFTs) with a poly(2-hydroxyethyl methacrylate) (PHEMA) gate dielectric on a plastic substrate. The ZnO nanorod film active layer, prepared by microwave heating, showed a highly uniform and densely packed array of large crystal size (58 nm) in the [002] direction of ZnO nanorods on the plasma-treated PHEMA. The flexible ZnO TFTs with the plasma-treated PHEMA gate dielectric exhibited an electron mobility of 1.1 cm(2) V(-1) s(-1), which was higher by a factor of approximately 8.5 than that of ZnO TFTs based on the bare PHEMA gate dielectric.
