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Atomically Traceable Nanostructure Fabrication

Atomically Traceable Nanostructure Fabrication

Published on: July 17, 2015

Exploiting substrate stress to modify nanoscale SAM patterns.

Chetana Singh¹, Alicia M Jackson, Francesco Stellacci

¹Department of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48109, USA.

Journal of the American Chemical Society

|October 28, 2009

Summary

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Researchers developed a new method to control nanoscale patterns in self-assembled monolayers by inducing substrate stress. This technique rapidly transforms arrested patterns into desired striped structures, even on curved surfaces like nanoparticles.

Area of Science:

Materials Science
Surface Chemistry
Nanotechnology

Background:

Self-assembled monolayers (SAMs) form nanoscale patterns.
Controlling these patterns, especially reaching equilibrium states, is challenging.
Kinetically arrested states can hinder access to desired equilibrium structures.

Purpose of the Study:

To introduce a simple method for modifying and controlling nanoscale phase-separated patterns in SAMs.
To accelerate the transition from kinetically arrested states to equilibrium patterns.
To investigate the influence of substrate curvature on pattern formation.

Main Methods:

Utilizing postadsorption substrate stress induction.
Employing mesoscale computer simulations.

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Conducting experimental investigations.

Main Results:

The stress induction method effectively modifies and controls nanoscale phase-separated patterns.
Kinetically arrested patchy patterns were rapidly transformed into equilibrium striped patterns.
Substrate curvature, specifically on spherical nanoparticles and nanocylinders, was shown to influence the formation of aligned stripes.

Conclusions:

Postadsorption substrate stress induction is a viable method for controlling SAM patterns.
This technique provides efficient access to equilibrium striped patterns.
Curvature plays a significant role in the formation of molecularly aligned stripes on nanostructured surfaces.