Artifact reduction of susceptibility-weighted imaging using a short-echo phase mask

Y Ishimori1, M Monma, Y Kohno

  • 1Department of Radiological Sciences, baraki Prefectural University of Health Sciences, Inashiki-gun, Ibaraki, Japan. ishimori@ipu.ac.jp

Summary

Susceptibility-weighted imaging (SWI) artifacts can be reduced by using a short-echo phase mask. This method improves deep vein visibility without compromising image quality in MR venography.

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