Related Experiment Video
Updated: Jun 18, 2026

Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices
Published on: December 7, 2017
Single ZnO nanobelt based field effect transistors (FETs)
Y K Park1, Ahmad Umar, E W Lee
1School of Semiconductor and Chemical Engineering, BK 21 Centre for Future Energy Materials and Devices and Nanomaterials Processing Research Centre, Chonbuk National University, Jeonju 561-756, South Korea.
Abstract:
Electrical properties of single ZnO nanobelt have been examined by fabricating single nanobelt based field effect transistors (FETs). The ZnO nanobelts were grown via non-catalytic simple thermal evaporation process by using metallic zinc powder in the presence of oxygen. The detailed structural and optical characterizations confirmed that the grown nanobelts are well-crystalline with the wurtzite hexagonal phase and exhibiting good optical properties. The passivation effect on the electrical characteristics of the as-grown nanobelts was also evaluated by passivating the fabricated FETs with polymethyl methacrylate (PMMA). The passivated single ZnO nanobelt based FETs exhibited higher electrical performance as compared to non-passivated FETs due to reduction in the physically absorbed chemisorbed species such as O-, O2-, O2, or OH- etc. The field effect mobility (micro(eff)) of the fabricated nanobelt based non-passivated and passivated FETs was estimated to be approximately 21.3 and 59 cm2/V x s, respectively. Moreover the carrier concentration and peak transconductance of the fabricated non-passivated and passivated FET were calculated to be approximately 8.73 x 10(17) and approximately 1.86 x 10(18) cm(-3) and approximately 0.76 and 1.4 microS, respectively. This work offers substantial opportunities for further practical electronics and photonics nanodevice applications of ZnO based nanostructures.
More Related Videos
Related Concept Videos
Field Effect Transistor
Biasing of FET
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the gate...
MOSFET
In an n-MOSFET, the structure includes n-type source and drain...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no current...
MOSFET: Depletion Mode
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity arises...
Characteristics of MOSFET
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable quicker...

