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Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices
Published on: December 7, 2017
Single ZnO nanowire based high-performance field effect transistors (FETs)
Yong Kyu Park1, Ahmad Umar, Jin-Seok Kim
1School of Semiconductor and Chemical Engineering, BK21 Centre for Future Energy Materials and Devices, Nanomaterials Processing Research Centre, Chonbuk National University, Jeonju 561756, South Korea.
Fabricating top-gate field-effect transistors (FETs) with zinc oxide (ZnO) nanowires yielded superior electrical properties compared to back-gate designs. This study highlights ZnO nanowire FETs for enhanced electronic applications.
Area of Science:
- Materials Science
- Nanotechnology
- Electrical Engineering
Background:
- Single zinc oxide (ZnO) nanowires are promising for electronic devices.
- Fabricating field-effect transistors (FETs) is crucial for characterizing nanowire electrical properties.
Purpose of the Study:
- To investigate and compare the electrical properties of ZnO nanowire-based FETs using two distinct gate configurations.
- To evaluate the impact of fabrication approach on device performance.
Main Methods:
- Synthesized ZnO nanowires via non-catalytic thermal evaporation.
- Fabricated back-gate and top-gate FETs using electron beam lithography and photolithography.
- Characterized structural and optical properties of ZnO nanowires.
Main Results:
- Well-crystallized ZnO nanowires with wurtzite hexagonal phase and good optical properties were obtained.
- Top-gate FETs demonstrated higher peak transconductance (approx. 7.4 nS) than back-gate FETs (approx. 3.2 nS).
- Field-effect mobility was significantly higher in top-gate FETs (7.87 cm²/V·s) compared to back-gate FETs (3.4 cm²/V·s).
Conclusions:
- Top-gate FETs fabricated with ZnO nanowires exhibit superior electrical performance.
- The top-gate approach is more effective for realizing high-performance ZnO nanowire electronic devices.
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