Plasmonic nano lithography with a high scan speed contact probe

Area of Science:

• Nanotechnology
• Materials Science
• Optics

Background:

• Conventional lithography techniques face limitations in speed and resolution.
• Plasmonic lithography offers potential for nanoscale patterning but often requires precise gap control.
• Developing methods for high-speed, high-resolution patterning is crucial for advanced manufacturing.

Purpose of the Study:

• To demonstrate a novel plasmonic lithography method using an optical contact probe.
• To achieve high-speed patterning without external gap distance control.
• To evaluate the resolution and quality of the patterned features.

Main Methods:

• Utilized an optical contact probe for plasmonic lithography.
• Integrated a 10 nm silica glass film on the probe's bottom surface for inherent gap control.
• Coated the probe with a self-assembled monolayer (SAM) to minimize friction.
• Performed patterning on photoresist materials.

Main Results:

• Achieved a patterning resolution of approximately 50 nm.
• Demonstrated a high patterning speed of approximately 10 mm/s.
• Obtained line patterning quality comparable to conventional optical lithography.

Conclusions:

• The developed plasmonic lithography technique enables high-speed, high-resolution patterning.
• The integrated silica film and SAM coating effectively manage gap distance and friction.
• This approach offers a promising alternative to conventional lithography for nanoscale fabrication.