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Updated: Jun 17, 2026

The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry

The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry

Published on: August 12, 2013

High resolution interferometer with multiple-pass optical configuration.

Jeongho Ahn¹, Jong-Ahn Kim, Chu-Shik Kang

¹Division of Mechanical Engineering, KAIST, 335 Gwahangno, Yuseong-gu, Daejeon, 305-701, Republic of Korea.

|December 10, 2009

Summary

This summary is machine-generated.

A novel multi-pass interferometer achieves fourteen times higher resolution than conventional designs. This advanced optical instrument demonstrates approximately 45 nm resolution, minimizing measurement errors for precise scientific applications.

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Area of Science:

Optical Engineering
Metrology

Background:

Conventional interferometers have limitations in resolution and measurement accuracy.
Improving optical resolution is crucial for advanced scientific and industrial applications.

Purpose of the Study:

To develop a novel interferometer with significantly enhanced resolution compared to conventional single-pass systems.
To investigate the feasibility of a multi-pass optical configuration for high-resolution measurements.

Main Methods:

Designed a two-dimensional corner cube array block to create a multiple-pass optical path.
Utilized a symmetric structure within the corner cube array to minimize measurement errors.
Calculated the impact of alignment errors and corner cube imperfections at the picometer level.

Main Results:

Achieved an optical resolution of approximately 45 nanometers (nm).
Demonstrated a nonlinearity of about 0.5 nm in peak-to-valley.
The symmetric design effectively minimized measurement errors.

Conclusions:

The developed multi-pass interferometer offers a fourteen-fold increase in resolution over conventional designs.
The novel optical configuration and symmetric corner cube array enable high-precision measurements.
This technology has potential applications in fields requiring ultra-precise metrology.