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Monolithic double-grating phase mask for large-period highly coherent grating printing.

Y Bourgin¹, S Bakkali, Y Jourlin

¹Université de Lyon, F-42023 Saint-Etienne, France.

|December 18, 2009

Summary

A novel double-grating phase mask creates large-period interference patterns. This enables the fabrication of unlimitedly long gratings for advanced applications.

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Area of Science:

Optics and Photonics
Materials Science

Background:

Diffraction gratings are crucial optical components.
Fabricating large-period gratings with high precision is challenging.

Purpose of the Study:

To develop a new method for fabricating large-period gratings.
To enable the creation of unlimitedly long gratings using a phase mask.

Main Methods:

A monolithic double-grating phase mask with specific spatial frequencies (k1 and k2) was designed.
The phase mask was used to generate a large-period interferogram without higher harmonics.
A write-on-the-fly scheme was employed for grating fabrication.

Main Results:

The phase mask successfully produced a latent grating with a spatial frequency of 2(k2)-k(1).

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The method allows for the creation of interferograms without unwanted higher harmonics.

Unlimitedly long gratings were fabricated using this technique.

Conclusions:

The monolithic double-grating phase mask is an effective tool for fabricating large-period gratings.
This method offers a scalable solution for producing long gratings for various applications.
The write-on-the-fly scheme combined with the phase mask advances grating fabrication technology.