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Mask aligner lithography using laser illumination for versatile pattern generation.

T Weichelt, Y Bourgin, U D Zeitner

    Optics Express
    |October 19, 2017
    PubMed
    Summary

    Researchers replaced mercury lamps with solid-state lasers in mask aligner lithography. This advancement improves high-resolution patterning capabilities for microfabrication applications.

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    Area of Science:

    • Microlithography
    • Optical Engineering
    • Materials Science

    Background:

    • Mask aligner lithography is a standard back-end fabrication process.
    • Existing systems using mercury lamps face resolution limitations for high-precision patterning.
    • Resolution enhancement techniques from projection lithography are being adapted for mask aligners.

    Purpose of the Study:

    • To enhance the resolution capabilities of mask aligner lithography.
    • To overcome the limitations of mercury vapor lamps in current mask aligner systems.
    • To introduce a novel illumination system for mask aligner lithography.

    Main Methods:

    • Replaced the mercury vapor lamp with a solid-state laser in the mask aligner illumination system.
    • Utilized a rotating diffuser to expand the laser beam and mitigate speckle effects for full-field illumination.
    • Integrated a galvanometer scanner to control the angular spectrum distribution of the photomask illumination.

    Main Results:

    • Demonstrated the successful implementation of a solid-state laser illumination system in a mask aligner.
    • Achieved versatile patterning results, including simple binary patterns (squares, triangles) and complex structures (blazed gratings).
    • Showcased the ability to control the angular spectrum for flexible illumination strategies.

    Conclusions:

    • The solid-state laser illumination system effectively extends the capabilities of mask aligner lithography.
    • This technological advancement enables higher resolution patterning than previously possible with mercury lamps.
    • The system offers flexibility in illumination control, opening new possibilities for advanced microfabrication.