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Ionic polishing of optical surfaces
J B Schroeder1, S Bashkin, J F Nester
1Research Department, The Perkin-Elmer Corporation, Norwalk, Connecticut, USA.
Applied Optics
|January 6, 2010
Summary
Controlled material removal from insulators was achieved using a positive ion beam, with a sputtering yield of unity observed between 0.5-2.0 MeV. This method shows promise for manufacturing high-quality optical surfaces.
Area of Science:
- Materials Science
- Surface Engineering
- Ion Beam Technology
Background:
- Controlled surface modification is crucial for advanced material applications.
- Traditional methods for insulator surface processing can be limited in precision and quality.
- Ion beam techniques offer potential for highly controlled material removal.
Purpose of the Study:
- To investigate the controlled removal of material from insulator surfaces using a positive ion beam.
- To determine the sputtering yield in a specific energy range.
- To explore the feasibility of this technique for manufacturing high-quality optical surfaces.
Main Methods:
- Irradiation of insulator surfaces with a positive ion beam.
- Varying the ion beam energy within the 0.5-2.0 MeV range.
- Analysis of material removal and surface characteristics.
Main Results:
- Demonstrated controlled material removal from insulator surfaces.
- Observed a sputtering yield of unity within the 0.5-2.0 MeV energy range.
- Identified the potential for achieving high-quality optical surface finishes.
Conclusions:
- Positive ion beam irradiation is an effective method for controlled insulator surface modification.
- A sputtering yield of unity at 0.5-2.0 MeV suggests efficient material removal.
- The technique is a viable candidate for the fabrication of precision optical components.
