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Inverse model of fiber probe aperture size using a non-destructive method
Zone-Ching Lin1, Ching-Been Yang
1Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan, Republic of China. zclin@mail.ntust.edu.tw
Scanning
|January 14, 2010
Summary
This study introduces a non-destructive method to accurately determine fiber probe aperture size using inverse calculation. This technique offers a significant advancement over destructive measurement methods for photolithography applications.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Near-field photolithography relies on precise control of optical parameters.
- Accurate measurement of fiber probe aperture is crucial for lithographic process control.
- Current destructive measurement methods limit process optimization.
Purpose of the Study:
- To develop a novel, non-destructive method for inverse calculation of fiber probe aperture size.
- To establish theoretical line segment fabrication models for near-field photolithography.
- To validate the inverse calculation model against experimental and SEM data.
Main Methods:
- Utilized radiation field theory, Dill's exposure model, and Mack's development model.
- Combined theoretical modeling with experimental data to create an inverse calculation theory.
- Employed the Levenberg-Marquardt method for optimizing the convergence criterion.
Main Results:
- The inverse model accurately calculated fiber probe aperture size (d=250.6 nm).
- Results closely matched Scanning Electron Microscopy (SEM) certified average size (d(avg)=253.4 nm).
- Demonstrated the ability to predict lithographic fabrication profiles using the inverse model.
Conclusions:
- The developed non-destructive inverse model provides a reliable and accurate method for fiber probe aperture measurement.
- This technique overcomes limitations of destructive measurement, offering significant industrial application value.
- The study contributes a novel approach to fiber probe aperture metrology in photolithography.
