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Lensfree On-chip Tomographic Microscopy Employing Multi-angle Illumination and Pixel Super-resolution

Lensfree On-chip Tomographic Microscopy Employing Multi-angle Illumination and Pixel Super-resolution

Published on: August 16, 2012

Using gray-based Taguchi method to construct multi-objective optimal model in super-resolution near-field

Ching-Been Yang¹, Hsiu-Lu Chiang

¹Department of Mechanical Engineering, Taoyuan Innovation Institute of Technology, Chung Li City, Taiwan, Republic of China. been@tiit.edu.tw

|July 7, 2012

Summary

This study introduces thermally induced super-resolution for near-field photolithography, optimizing fabrication parameters using Taguchi and gray relational analysis for enhanced working depth and precise line segment creation.

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Area of Science:

Materials Science and Engineering
Nanotechnology
Optical Engineering

Background:

Near-field photolithography faces challenges in achieving high resolution and multiple quality objectives simultaneously.
Thermally induced super-resolution offers a potential pathway to overcome diffraction limits in photolithography.

Purpose of the Study:

To integrate thermally induced super-resolution with near-field photolithography for line segment fabrication.
To optimize fabrication parameters using a combined Taguchi method and gray relational analysis to address multiple quality requirements.

Main Methods:

Utilized a laser beam through an optical fiber probe onto a thin indium film to create a sub-diffraction-limited melted aperture.
Employed the Taguchi method to obtain signal-to-noise (S/N) ratios and gray relational analysis to convert these into gray relational grades for multi-objective optimization.
Investigated parameters including probe aperture, exposure energy, development time, and indium film thickness.

Main Results:

Identified an optimal parameter combination (A1B2C3D1) using gray relational analysis, differing from the Taguchi method's optimal (A1B1C1D1).
Observed a -14.3% change in line width (126.2 nm to 144.2 nm) but a significant 140.4% improvement in working depth (5.7 nm to 13.7 nm).

Conclusions:

The integrated approach successfully generated thermally induced super-resolution, enabling fabrication of finer features.
The combination of Taguchi and gray relational analysis effectively resolved conflicting parameter level requirements for multiple quality objectives in photolithography.