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Atomic Force Microscopy
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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
Published on: June 12, 2018
F Dinelli1, C Menozzi, P Baschieri
1IPCF, Consiglio Nazionale delle Ricerche, CNR Campus, Via G. Moruzzi 1, Pisa PI 56100, Italy.
This study introduces a new nanoscale lithography method using scanning probe microscopy (SPM) and nanoimprint lithography (NIL). The technique enables real-time monitoring and control of the nanoimprint process for precise feature creation.
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