The use of photoresist as a holographic recording medium

A technique is described for recording holograms and forming diffraction gratings in Shipley AZ1350 photoresist using the 4579-A output from an argon laser. A pre-exposure technique is described that not only reduces exposure times but increases the signal-to-noise ratio of the image. It is also shown that the effects of the variable characteristic of the resist can be alleviated by monitoring diffraction efficiency during development.