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Optical contour mapping of surfaces.

W Jaerisch, G Makosch

|February 4, 2010

Summary

This summary is machine-generated.

This study introduces a precise optical contour mapping method for noncontact surface deformation testing. The technique uses an optical grating to create a fringe pattern, enabling adjustable sensitivity for precise measurements.

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Area of Science:

Optics
Metrology
Materials Science

Background:

Accurate measurement of surface deformations is critical in various scientific and industrial applications.
Existing methods may lack the required precision, sensitivity, or noncontact capabilities for certain materials and geometries.

Purpose of the Study:

To describe a novel nondestructive optical contour mapping method for precise surface deformation testing.
To demonstrate adjustable sensitivity for measuring deformations up to 30 micrometers per centimeter.
To present applications in semiconductor wafer and photomask flatness testing.

Main Methods:

Utilizes an optical grating placed in front of the test surface.
Employs monochromatic plane wave illumination to generate an interference pattern from two diffraction orders.
Creates a fringe pattern through reflection and superposition with the grating, combining interference and moiré line systems.

Main Results:

The method provides precise, nondestructive, and noncontact optical contour mapping.
Adjustable sensitivity allows for measurement of surface deformations up to 30 micrometers per centimeter.
The fringe pattern's contour lines correspond to specific surface deformations based on light wavelength and grating parameters.

Conclusions:

The described optical contour mapping method offers a versatile and precise tool for surface deformation analysis.
The ability to adjust the measurement scale makes it adaptable to diverse testing requirements.
Successful application in testing the flatness of semiconductor wafers and photomasks highlights its practical utility.