Heat-processed photoresist for holographic data storage applications

The experimental evaluation of a new heat-processed photoresist is reported with reference to holographic data storage applications. Two attractive features of the photoresist are (1) holographic reconstruction parameters comparable to the best photographic emulsions and (2) orthochromatic exposure sensitivity optimized for the 488-nm line of an argon laser. The preparation, use, and general properties of the photoresist are discussed, and relevant experimental data for important holographic parameters such as diffraction efficiency and storage density are presented.