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Combination moisture resistant and antireflection plasma polymerized thin films for optical coatings
Applied Optics
|February 6, 2010
Summary
Plasma polymerization created moisture-resistant fluorocarbon films on alkali halide crystals. These thin films also offer antireflection properties and a single absorption band, enhancing material durability and optical performance.
Area of Science:
- Materials Science
- Polymer Chemistry
- Surface Science
Background:
- Alkali halide crystals are susceptible to moisture degradation.
- Developing protective coatings for sensitive optical materials is crucial.
- Thin polymer films can offer protective and functional properties.
Purpose of the Study:
- To develop highly moisture-resistant thin polymer films.
- To investigate the properties of plasma-polymerized fluorocarbon films.
- To assess the suitability of these films for coating hygroscopic crystals.
Main Methods:
- Utilized plasma polymerization under vacuum conditions (~0.1 Torr).
- Deposited thin fluorocarbon polymer films onto alkali metal halide crystals.
- Characterized film properties including moisture resistance, optical transmission, and infrared absorption.
Main Results:
- Achieved highly moisture-resistant thin polymer films.
- Films exhibited significant antireflection properties.
- A single, distinct absorption band was observed at 1200 cm(-1) within the 25,000-250 cm(-1) range.
Conclusions:
- Plasma polymerization is an effective technique for producing protective coatings on hygroscopic materials.
- Fluorocarbon films demonstrate excellent moisture resistance and desirable optical characteristics.
- The developed films enhance the stability and performance of alkali halide optical components.
