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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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Scanning Electron Microscopy

A scanning electron microscope (SEM) is used to study the surface features of a sample by using an electron beam that scans the sample surface in a two-dimensional manner. Typically, areas between ~1 centimeter to 5 micrometers in width can be imaged. SEM can be used to image bacteria, viruses, tissues as well as larger samples like insects. Conventional SEM gives a magnification ranging from 20X to 30,000X and spatial resolution of 50 to 100 nanometers.
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Updated: Jun 16, 2026

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
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Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope

Published on: May 28, 2016

High precision scanning ellipsometer.

D E Aspnes, A A Studna

    Applied Optics
    |February 6, 2010
    PubMed
    Summary
    This summary is machine-generated.

    This study details a high-precision photometric ellipsometer, a rotating-analyzer instrument. It enables rapid, accurate measurement of optical properties across a broad spectral range.

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    The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry
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    The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry

    Published on: August 12, 2013

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    Last Updated: Jun 16, 2026

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    The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry

    Published on: August 12, 2013

    Area of Science:

    • Optical Physics and Instrumentation
    • Materials Science and Spectroscopy

    Background:

    • Ellipsometry is a powerful technique for characterizing material optical properties.
    • Traditional ellipsometers can be limited by speed, precision, or spectral range.

    Purpose of the Study:

    • To design, construct, and calibrate a novel photometric ellipsometer.
    • To achieve high precision and broad spectral coverage for optical characterization.

    Main Methods:

    • Utilized a rotating-analyzer ellipsometer design.
    • Employed digital sampling with an analog-to-digital converter and minicomputer-based Fourier transforming for data acquisition.
    • Achieved rapid data acquisition (<7 msec per cycle) at a 74 Hz rotation frequency.

    Main Results:

    • Demonstrated high intrinsic precision, limited primarily by shot noise and source instabilities.
    • Enabled determination of complex reflectance ratios as continuous functions of wavelength (near-infrared to near-ultraviolet).
    • Showcased the system's versatility for calculating complex refractive index, dielectric functions, film thicknesses, and refractive indices.

    Conclusions:

    • The developed photometric ellipsometer offers a precise and efficient method for optical characterization.
    • The system's adaptability allows for diverse material property analysis across a wide spectral range.
    • Further precision improvements are possible through data accumulation.