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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
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Plasma electrochemistry in ionic liquids: deposition of copper nanoparticles

M Brettholle1, O Höfft, L Klarhöfer

  • 1Institute of Particle Technology, Clausthal University of Technology, Robert-Koch-Str, 42, D-38678 Clausthal-Zellerfeld, Germany.

Physical Chemistry Chemical Physics : PCCP
|February 11, 2010
PubMed

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