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Measuring the infrared absorption in thin film coatings
Applied Optics
|February 23, 2010
Summary
A new laser calorimetric technique directly measures optical absorption in thin dielectric films. This method separates surface and bulk heat for accurate film absorption coefficient determination.
Area of Science:
- Materials Science
- Optics
- Thin Film Technology
Background:
- Traditional methods for measuring thin dielectric film optical absorption rely on comparative techniques.
- These methods involve comparing coated and uncoated substrates, which can introduce inaccuracies.
Purpose of the Study:
- To develop a direct measurement technique for optical absorption in thin dielectric films.
- To eliminate the need for comparative or difference methods in absorption measurements.
Main Methods:
- A novel laser calorimetric technique was employed using long, bar-shaped samples.
- The method distinguishes between surface and bulk heat generated by laser absorption.
- Absorption coefficients were extracted from the temperature-time curve slopes.
Main Results:
- The developed technique successfully determined the optical absorption coefficient for single-layer films.
- Films of As(2)S(3), CaF(2), ThF(4), and PbF(2) on a KCl substrate were analyzed.
- Direct measurement of film absorption was achieved without comparative analysis.
Conclusions:
- The new laser calorimetric approach provides a direct and accurate method for measuring thin film optical absorption.
- This technique simplifies the measurement process by avoiding comparative substrate analysis.
- The method is applicable to various dielectric film materials.
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