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Published on: May 25, 2021
Simulations of negative ion plasma sheaths
1INFN-LNL, viale dell'Universita n. 2, 35020 Legnaro (PD), Italy. cavenago@lnl.infn.it
This study models one-dimensional negative ion beams in high current sources. Results show that bias voltage influences inverted sheath formation and H(-) current, crucial for plasma simulations.
Area of Science:
- Plasma Physics
- Computational Physics
- Beam Dynamics
Background:
- Accurate modeling of negative ion beams is essential for high current sources.
- One-dimensional (1D) models are fundamental for understanding sheath/presheath physics and numerical solver stability, despite the need for finer simulation meshes (e.g., Debye length, $\lambda_D \approx 0.01$ mm).
Purpose of the Study:
- To investigate a 1D model for negative ion production from an extraction wall/grid.
- To analyze the influence of a driver plasma and bias voltage on plasma sheath structure and beam current.
Main Methods:
- A 1D model incorporating negative ion production from the extraction surface.
- Coupling to a driver plasma acting as an electron and proton reservoir with variable plasma potential.
- Particle motion modeled via diffusion equations (protons) and magnetized electrons; Poisson equation solved globally.
Main Results:
- The formation of an inverted sheath was observed.
- The forward current of negative hydrogen ions (H(-)) was found to be sensitive to the applied bias voltage between lateral walls and the extraction wall.
Conclusions:
- The 1D model provides fundamental insights into sheath physics and numerical stability for negative ion beam simulations.
- Bias voltage is a critical parameter affecting inverted sheath formation and H(-) current, impacting the design and operation of high current negative ion sources.
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