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Related Experiment Video

Updated: Jun 15, 2026

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
11:10

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Published on: May 23, 2018

Optical coatings in microscale channels by atomic layer deposition.

Nicholas T Gabriel1, Joseph J Talghader

  • 1Department of Electrical and Computer Engineering, University of Minnesota, 200 Union Street SE, Minneapolis, Minnesota 55455, USA.

Applied Optics
|March 12, 2010
PubMed
Summary

Atomic layer deposition (ALD) coats high-aspect-ratio channels uniformly. Aluminum oxide coatings showed astounding uniformity, while hafnium oxide requires optimization but still surpasses other methods for optical applications.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Optical Engineering

Background:

  • Atomic layer deposition (ALD) is suitable for coating high-aspect-ratio structures like silicon trenches.
  • Optical and microfluidic applications require centimeter-deep channels, posing challenges in temperature and gas flow uniformity.
  • Quantifying ALD coating uniformity in large-scale, high-aspect-ratio geometries is crucial.

Purpose of the Study:

  • To evaluate the uniformity of optical coatings deposited by ALD in a high-aspect-ratio geometry.
  • To assess the performance of ALD aluminum oxide and hafnium oxide for optical applications.
  • To validate optical cavity performance within a non-uniform deposition environment.

Main Methods:

  • An air wedge was created between two 7 cm silicon wafers, with a gap varying from 0-1560 micrometers.
  • Atomic layer deposition (ALD) was used to deposit aluminum oxide and hafnium oxide coatings.
  • A six-layer Fabry-Perot optical cavity was deposited and its resonant wavelength measured.

Main Results:

  • ALD aluminum oxide coatings exhibited astounding uniformity within the wedge.
  • ALD hafnium oxide showed potential but required further process optimization.
  • Measured resonant wavelengths of the Fabry-Perot cavity closely matched predictions, with deviations in the deepest regions.
  • ALD performance exceeded that of other deposition techniques for these challenging geometries.

Conclusions:

  • ALD is a viable technique for achieving uniform optical coatings in large, high-aspect-ratio channels.
  • Aluminum oxide demonstrates excellent uniformity, while hafnium oxide needs optimization for such applications.
  • ALD-coated optical cavities show promise for microfluidic and optical devices, despite minor variations in extreme depths.