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Updated: Jun 15, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Patterning pentacene surfaces by local oxidation nanolithography
N S Losilla1, J Martinez, E Bystrenova
1Instituto de Microelectrónica de Madrid: CSIC, Isaac Newton 8, Tres Cantos, Madrid, Spain. nuria@imm.cnm.csic.es
Abstract:
Sequential and parallel local oxidation nanolithographies have been applied to pattern pentacene samples by creating a variety of nanostructures. The sequential local oxidation process is performed with an atomic force microscope and requires the application of a sequence of voltage pulses of 36V for 1ms. The parallel local oxidation process is performed by using a conductive and patterned stamp. Then, a voltage pulse is applied between the stamp and the pentacene surface. Patterns formed by arrays of parallel lines covering 1mm(2) regions and with a periodicity of less than 1microm have been generated in a few seconds. We also show that the patterns can be used as templates for the deposition of antibodies.

