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Optimizing null ellipsometry for oxidized silicon.

G H Bu-Abbud, N M Bashara

    Applied Optics
    |March 25, 2010
    PubMed
    Summary
    This summary is machine-generated.

    Polarizer imperfections cause errors in optical parameter estimation. Using the polarizer, specimen, compensator, analyzer (PSCA) arrangement significantly reduces these errors and improves measurement precision for systems like oxidized silicon.

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    Area of Science:

    • Materials Science
    • Optical Physics
    • Surface Science

    Background:

    • Polarizer imperfections lead to systematic errors in optical parameter measurements.
    • Low absorbing systems, such as oxidized silicon, are particularly susceptible to these errors.
    • Existing measurement arrangements like PCSA have limitations in precision and accuracy.

    Purpose of the Study:

    • To investigate the impact of polarizer imperfections on optical parameter estimation.
    • To evaluate the effectiveness of the polarizer, specimen, compensator, analyzer (PSCA) arrangement in mitigating these errors.
    • To compare the performance of PSCA with the PCSA arrangement for oxidized silicon.

    Main Methods:

    • Utilized the polarizer, specimen, compensator, analyzer (PSCA) optical measurement configuration.
    • Performed measurements near the principal angle of incidence for enhanced sensitivity.
    • Compared measurement results with the conventional polarizer, compensator, specimen, analyzer (PCSA) arrangement.
    • Analyzed data for silicon samples with natural oxide layers.

    Main Results:

    • The PSCA arrangement significantly reduces systematic errors caused by polarizer imperfections.
    • Measurements using PSCA showed a 20-fold reduction in Delta discrepancies between zones.
    • PSCA measurements near the principal angle improved precision by a factor of 10-50 compared to PCSA.
    • Demonstrated improved accuracy for optical parameters of oxidized silicon.

    Conclusions:

    • The PSCA configuration offers a substantial improvement in accuracy and precision for optical measurements.
    • PSCA is particularly advantageous for analyzing low absorbing thin films and surfaces.
    • This method provides a more reliable approach for characterizing optical properties of materials like oxidized silicon.