Atom-by-atom structural and chemical analysis by annular dark-field electron microscopy.
Ondrej L Krivanek1, Matthew F Chisholm, Valeria Nicolosi
1Nion Co., 1102 8th Street, Kirkland, Washington 98033, USA. krivanek@nion.com
Nature
|March 26, 2010
Summary
Researchers can now image and identify every atom in ultra-thin materials using advanced transmission electron microscopy. This breakthrough allows for detailed analysis of atomic substitutions and distortions in materials like hexagonal boron nitride.
Area of Science:
- Materials Science
- Nanotechnology
- Analytical Chemistry
Background:
- Transmission electron microscopy (TEM) has long been envisioned for atomic-level imaging.
- Aberration-corrected optics have significantly advanced TEM capabilities.
- Resolving and identifying all atoms in non-periodic, multi-element materials remains a challenge.
Purpose of the Study:
- To demonstrate atom-by-atom imaging and chemical identification in ultra-thin materials.
- To analyze substitutional defects in monolayer hexagonal boron nitride (h-BN).
- To achieve direct resolution of atomic-scale structural distortions.
Main Methods:
- Utilized aberration-corrected scanning transmission electron microscopy (STEM) with annular dark-field (ADF) imaging.
- Operated the STEM at low voltage for enhanced sensitivity.
- Employed density functional theory (DFT) calculations for verification.
Main Results:
- Successfully resolved and identified the chemical type of every atom in monolayer h-BN.
- Detected and characterized three types of substitutional defects: C on B, C on N, and O on N sites.
- Directly observed in-plane distortions of approximately 0.1 Å caused by substitutions.
Conclusions:
- Atom-by-atom structural and chemical analysis is now possible for radiation-damage-resistant atoms in ultra-thin sheets.
- This technique provides unprecedented insight into atomic-scale defects and their impact on material structure.
- The findings pave the way for advanced characterization of 2D materials and nanostructures.
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