Related Experiment Video
Updated: Jun 13, 2026
Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
Published on: April 1, 2020
Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates
Suresh Sridaran1, Sunil A Bhave
1OxideMEMS Lab, School of Electrical and Computer Engineering, Cornell University, Ithaca, NY 14850, USA. ss625@cornell.edu
Abstract:
We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics.
