Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Remote assessment of the Penn computerised neurocognitive battery in individuals with 22q11.2 deletion syndrome.

Journal of intellectual disability research : JIDR·2024
Same author

The COVID-19 pandemic's impact on worry and medical disruptions reported by individuals with chromosome 22q11.2 copy number variants and their caregivers.

Journal of intellectual disability research : JIDR·2022
Same author

Association among income loss, financial strain and depressive symptoms during COVID-19: evidence from two longitudinal studies.

medRxiv : the preprint server for health sciences·2020
Same author

Apnoeic oxygenation during intubation: a systematic review and meta-analysis.

Anaesthesia and intensive care·2017
Same author

Modification of threat-processing in non-anxious individuals: a preliminary behavioral and ERP study.

Journal of behavior therapy and experimental psychiatry·2013
Same author

Telomerase inhibitors.

Trends in biotechnology·2001

Related Experiment Video

Updated: Jun 12, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Contact hole imaging characteristics from projection lithography.

L K White

    Applied Optics
    |May 22, 2010
    PubMed
    Summary

    Image intensity profiles reveal contact hole imaging quality. At high resolution, contact holes resemble gratings, but aberrations impact imaging, offering a way to measure lens system imperfections.

    Area of Science:

    • Optical lithography
    • Microscopy
    • Semiconductor manufacturing

    Background:

    • Contact hole imaging is critical for semiconductor manufacturing.
    • Understanding image intensity profiles (IIPs) is key to assessing imaging quality.
    • Defocus aberration significantly impacts lithographic processes.

    Purpose of the Study:

    • To compare image intensity profiles (IIPs) of contact holes with gratings.
    • To evaluate the impact of defocus aberration on contact hole imaging.
    • To assess the sensitivity of contact hole imaging to optical lens aberrations.

    Main Methods:

    • Calculation of IIPs for contact hole arrays with defocus aberration.
    • Comparison of contact hole IIPs with those from dimensionally similar gratings.

    More Related Videos

    Soft Lithographic Procedure for Producing Plastic Microfluidic Devices with View-ports Transparent to Visible and Infrared Light
    10:26

    Soft Lithographic Procedure for Producing Plastic Microfluidic Devices with View-ports Transparent to Visible and Infrared Light

    Published on: August 17, 2017

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
    07:47

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

    Published on: February 12, 2017

    Related Experiment Videos

    Last Updated: Jun 12, 2026

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
    10:25

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

    Published on: September 14, 2018

    Soft Lithographic Procedure for Producing Plastic Microfluidic Devices with View-ports Transparent to Visible and Infrared Light
    10:26

    Soft Lithographic Procedure for Producing Plastic Microfluidic Devices with View-ports Transparent to Visible and Infrared Light

    Published on: August 17, 2017

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
    07:47

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

    Published on: February 12, 2017

  • Analysis of advanced lens systems with varying depth of focus characteristics.

    • Main Results:

    • At resolution levels >= 0.9 lambda/N.A., contact hole imaging quality approximates that of gratings.
    • Contact hole shapes are generally predicted well, but dimensional comparisons reveal imaging imperfections.
    • Contact hole imaging is highly sensitive to residual aberrations in optical systems.

    Conclusions:

    • Contact hole imaging performance is comparable to gratings at high resolution under ideal conditions.
    • Experimental results indicate limitations in current imaging fidelity for contact holes.
    • Contact hole imaging serves as a sensitive metric for evaluating optical lens aberrations in advanced lithography.