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Related Concept Videos

X-ray Crystallography02:18

X-ray Crystallography

The size of the unit cell and the arrangement of atoms in a crystal may be determined from measurements of the diffraction of X-rays by the crystal, termed X-ray crystallography.
Diffraction
Diffraction is the change in the direction of travel experienced by an electromagnetic wave when it encounters a physical barrier whose dimensions are comparable to those of the wavelength of the light. X-rays are electromagnetic radiation with wavelengths about as long as the distance between neighboring...
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In the late 1800s, the revelation that light extended beyond visible wavelengths led to the discovery of X-rays by Wilhelm Roentgen. Recognized as high-energy electromagnetic radiation with short wavelengths, X-rays prompted exploration into their interaction with crystals. Max von Laue proposed in 1912 that the periodic arrangement of atoms, ions, or molecules in crystals would cause them to diffract X-rays, a hypothesis confirmed through experiments with copper sulfate and zinc sulfide...
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X-ray Diffraction of Biological Samples

X-ray diffraction or XRD is an analytical tool that utilizes X-rays to study ordered structures such as crystalline organic and inorganic samples, polycrystalline materials, proteins, carbohydrates, and drugs.
According to Bragg's law, when X-rays strike the sample positioned on a stage, the rays are  scattered by the electron clouds around the sample atoms. The  X-ray diffraction or scattering is caused by constructive interference of the X-ray waves that reflect off the internal crystal...

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Related Experiment Video

Updated: Jun 12, 2026

Scanning Light Scattering Profiler (SLPS) Based Methodology to Quantitatively Evaluate Forward and Backward Light Scattering from Intraocular Lenses
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Optical method for inspecting LSI patterns using reflected diffraction waves.

S Kimura, K Suda, S Hase

    Applied Optics
    |June 10, 2010
    PubMed
    Summary
    This summary is machine-generated.

    This study introduces an optical inspection method for detecting defects in LSI lithographic patterns. The system uses a laser beam and random access memories to rapidly identify flaws as small as 0.8 micrometers.

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    Published on: February 27, 2013

    Area of Science:

    • Semiconductor manufacturing
    • Optical metrology
    • Integrated circuit fabrication

    Background:

    • Defect detection is critical for ensuring the quality and reliability of Large-Scale Integrated (LSI) circuits.
    • Traditional inspection methods can be time-consuming and may not detect sub-micrometer defects effectively.
    • Advancements in lithography necessitate faster and more sensitive inspection techniques.

    Purpose of the Study:

    • To develop a rapid and sensitive optical inspection method for identifying defects in LSI lithographic patterns.
    • To leverage diffraction wave analysis for defect characterization.
    • To integrate signal processing with memory technology for real-time defect detection.

    Main Methods:

    • Utilizing a focused Helium-Neon (He-Ne) laser beam to scan LSI patterns on a wafer.
    • Observing and analyzing the diffraction waves reflected from the scanned patterns.
    • Employing random access memories (RAM) for direct input of wave signals to enable rapid defect judgment.

    Main Results:

    • The developed optical inspection system successfully detects defects with a minimum size of approximately 0.8 micrometers.
    • The system achieves a high inspection speed, capable of inspecting a 1 cm(2) chip in just 9 seconds.
    • Diffraction wave analysis proved effective in characterizing pattern defects.

    Conclusions:

    • The proposed optical inspection method offers a fast and accurate solution for detecting small defects in LSI lithographic patterns.
    • The integration of optical sensing with RAM technology significantly enhances inspection efficiency.
    • This technique holds potential for improving quality control in semiconductor manufacturing.