Blazed x-ray reflection gratings fabricated by electron beam lithography

Area of Science:

• Materials Science
• Nanotechnology
• Optics

Background:

• Blazed gratings are crucial optical components.
• Fabrication of gratings with controlled nanoscale vertical dimensions presents challenges.

Purpose of the Study:

• To demonstrate the fabrication of blazed gratings with highly controlled, extremely small vertical dimensions.
• To explore the utility of electron beam lithography for creating nanoscale optical structures.

Main Methods:

• Utilized electron beam lithography.
• Employed polymethyl methacrylate (PMMA) as the electron-resist material.
• Focused on achieving precise control over the vertical dimensions of the gratings.

Main Results:

• Successfully fabricated blazed gratings with well-controlled, extremely small vertical dimensions.
• Demonstrated the feasibility of nanoscale grating fabrication using the specified method.

Conclusions:

• Electron beam lithography is an effective technique for producing nanoscale blazed gratings in PMMA.
• This method enables the creation of advanced optical components with precise vertical feature control.