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Contouring by electronic speckle pattern interferometry employing dual beam illumination
Applied Optics
|June 22, 2010
Abstract:
In this paper we extend and study the method for generating contours of diffuse objects employing a dual beam illumination coupled with electronic speckle pattern interferometry. The sensitivity and the orientation of the contour planes are analyzed. A novel method for tilting the planes of contours and experimental results incorporating phase shifting and fringe analysis are also presented. The theoretical and the experimental results show good agreement.
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