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Related Experiment Video

Updated: May 3, 2026

Phase Contrast and Differential Interference Contrast DIC Microscopy
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Differential interference contrast imaging on a real time confocal scanning optical microscope.

T R Corle, G S Kino

    Applied Optics
    |June 23, 2010
    PubMed
    Summary
    This summary is machine-generated.

    This study introduces Nomarski differential interference contrast imaging for confocal scanning microscopes, enabling precise edge height and width measurements. New imaging modes offer enhanced edge detection and phase linearity for advanced optical microscopy applications.

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    Area of Science:

    • Optical Microscopy
    • Nanotechnology
    • Metrology

    Background:

    • Confocal scanning optical microscopy is a powerful tool for high-resolution imaging.
    • Differential interference contrast (DIC) imaging enhances contrast in microscopy.
    • Measuring nanoscale features with high precision remains a challenge.

    Purpose of the Study:

    • To integrate Nomarski differential interference contrast (DIC) imaging with real-time confocal scanning optical microscopy.
    • To develop novel imaging modes for enhanced edge detection and phase measurement.
    • To demonstrate applications in semiconductor metrology and nanotechnology.

    Main Methods:

    • Implementation of Nomarski DIC with a confocal scanning optical microscope.
    • Development of three distinct imaging modes: average reflectivity elimination (nonlinear phase), linear phase superimposed on reflectivity, and reflectivity elimination with linear phase.
    • Application of these methods to specific metrology targets.

    Main Results:

    • Achieved unambiguous measurement of edge height and width, even for features taller than half a wavelength.
    • Demonstrated improved edge enhancement and phase linearity in imaging modes.
    • Successfully applied the technique to analyze box-in-box overlay targets, integrated circuit passivation layers, and measure sidewall slopes.

    Conclusions:

    • Nomarski DIC in confocal scanning microscopy provides superior edge metrology capabilities.
    • The developed imaging modes offer versatility for different sample types and measurement requirements.
    • This technique advances precision measurement in semiconductor manufacturing and nanoscale imaging.