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Updated: Jun 11, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
The use of ion-milling to control clustering of nanostructured, columnar thin films
Jonathan K Kwan1, Jeremy C Sit
1Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB, T6G 2V4, Canada. jkkwan@ualberta.ca
Abstract:
We present the use of ion-milling to reduce the capillary-induced clustering of vertical post nanostructures grown by glancing angle deposition. Nanostructures of several heights were grown and ion-milled for various times to investigate effects on post clustering. No clustering was observed given sufficient ion-mill exposure time, with the characteristic time being lower for shorter posts. The results demonstrate that these strengthened nanostructures are suitable for use in liquid environments.
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