Texture evolution of vertically aligned biaxial tungsten nanorods using RHEED surface pole figure technique

Vertically aligned biaxial tungsten nanorods with cubic A15 crystal structure were deposited by DC magnetron sputtering on native oxide covered Si(100) substrates with glancing angle flux incidence (theta approximately 85 degrees) and a two-step substrate rotation mode at room temperature. These vertical nanorods were grown to different thicknesses (10, 25, 50 and 100 nm) and analyzed for biaxial texture evolution using a highly surface sensitive reflection high-energy electron diffraction (RHEED) pole figure technique. The initial polycrystalline film begins to show the inception of biaxial texture with a fiber background between 10 and 25 nm. Biaxial texture development is eventually completed between 50 and 100 nm thicknesses of the film. The out-of-plane crystallographic direction is [002] and the in-plane texture is selected so as to obtain maximum capture area. In a comparison with 100 nm thick inclined tungsten nanorods deposited at 85 degrees without substrate rotation, it is found that the selection of in-plane texture does not maintain maximum in-plane capture area. This anomalous behavior is observed when the [002] texture axis is tilted approximately 17 degrees from the substrate normal in the direction towards the glancing incident flux.