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Atomic layer deposited titanium dioxide and its application in resonant waveguide grating.

T Alasaarela¹, T Saastamoinen, J Hiltunen

¹Department of Micro and Nanosciences, Aalto University School of Scienceand Technology, Micronova, PO Box 13500, FI-00076 Aalto, Finland. tapani.alasaarela@tkk.fi

|August 3, 2010

Summary

We achieved high-quality titanium dioxide (TiO2) thin films using atomic layer deposition. These films exhibit excellent optical properties, suitable for advanced photonic devices.

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Area of Science:

Materials Science
Optoelectronics
Nanotechnology

Background:

Thin films are crucial for optical devices.
Atomic layer deposition (ALD) offers precise control over film properties.
Titanium dioxide (TiO2) is a promising material for optical applications.

Purpose of the Study:

To demonstrate the growth of high-quality TiO2 thin films via ALD at a low temperature.
To characterize the optical properties of the fabricated TiO2 films.
To assess the suitability of TiO2 films for resonant waveguide grating fabrication.

Main Methods:

Atomic Layer Deposition (ALD) for TiO2 thin film growth at 120°C.
Spectroscopic ellipsometry for optical property analysis.
Prism coupling method for measuring waveguide propagation loss.

Main Results:

Demonstrated good optical quality TiO2 thin films grown at 120°C.
Measured a refractive index of 2.27.
Achieved slab waveguide propagation loss below 1 dB/cm at 1.53 micrometers.
Successfully fabricated a high-quality resonant waveguide grating using TiO2 on SiO2.

Conclusions:

Low-temperature ALD is effective for producing high-quality TiO2 optical films.
The fabricated TiO2 films possess excellent optical properties for photonic applications.
TiO2 films are suitable for creating advanced optical components like resonant waveguide gratings.