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Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a

Junyong Park¹, Sanghoon Yoon, Kisuk Kang

¹Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon, Republic of Korea.

Small (Weinheim an Der Bergstrasse, Germany)

|August 18, 2010

Summary

No abstract available in PubMed .

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