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Updated: Jun 10, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Photoresist resolution measurement during the exposure process

M S Sthel, C R Lima, L Cescato

    Applied Optics
    |August 19, 2010
    PubMed

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