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Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

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Automatic interference method for measuring transparent film thickness.

A González-Cano, E Bernabáu

|September 8, 2010

Summary

This summary is machine-generated.

A novel analytical method simplifies interferogram analysis for accurate thin film thickness determination. This approach is easily implemented for computerized processing, enhancing measurement efficiency.

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Area of Science:

Optics and Photonics
Materials Science

Background:

Interferometry is a crucial technique for optical measurements.
Accurate determination of thin film thickness is essential in various industries.

Purpose of the Study:

To introduce a new analytical method for obtaining interferogram forms.
To enable simple computerized treatment of interferograms.
To facilitate easy determination of thin film thickness.

Main Methods:

Development of an analytical approach to derive interferogram patterns.
Implementation of the method for computational analysis.

Main Results:

The proposed method provides an analytical form of the interferogram.
The technique allows for straightforward computerized processing.
Successful application in determining thin film thickness.

Conclusions:

The new analytical method offers an efficient and simple way to analyze interferograms.
This technique is valuable for precise thin film metrology.