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Multilevel-grating array generators: fabrication error analysis and experiments.

J M Miller, M R Taghizadeh, J Turunen

|September 8, 2010

Summary

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This study numerically evaluates errors in mask alignment and etch depth for multilevel-grating array illuminators. Fabricated 16-level fan-out elements show good agreement between predicted and actual performance, achieving high diffraction efficiency.

Area of Science:

Optics and Photonics
Microfabrication Technologies
Diffractive Optics

Background:

Multilevel-grating array illuminators are crucial optical components.
Understanding error sources like mask alignment and etch depth is vital for performance.
Array uniformity error (U) and diffraction efficiency (eta) are key performance metrics.

Purpose of the Study:

To numerically evaluate the impact of mask alignment and etch-depth errors on array uniformity error (U) and diffraction efficiency (eta).
To demonstrate the fabrication and performance of 16-level fan-out elements with specified array sizes.
To validate the error analysis predictions against experimental results.

Main Methods:

Numerical evaluation of error effects on grating illuminator performance.

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Fabrication of 16-level fan-out elements using electron-beam-written binary masks.

Utilizing optical alignment, contact copying, and reactive ion etching for fabrication.

Experimental characterization of fabricated components to measure U and eta.

Main Results:

Quantified the effects of mask alignment and etch-depth errors on U and eta.
Demonstrated 16-level fan-out elements with array sizes up to 32 x 16.
Achieved array uniformity error (U) between 5%-10% and diffraction efficiency (eta) between 83%-92% in fabricated elements.
Observed good agreement between numerical predictions and experimental performance.

Conclusions:

Mask alignment and etch-depth errors significantly influence the performance of multilevel-grating array illuminators.
The employed fabrication process is capable of producing high-performance fan-out elements.
The developed error analysis provides reliable predictions for fabricated optical components.