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Recent developments in profiling optical surfaces.

J M Bennett, V Elings, K Kjoller

|September 11, 2010

Summary

This summary is machine-generated.

Characterizing optical surfaces requires extending measurement techniques to shorter and longer wavelengths. This study compares atomic force microscopy and stylus profiling, finding consistent results for improved surface fabrication.

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Area of Science:

Optical engineering
Surface metrology
Materials science

Background:

Fabrication of smoother, lower-scatter optical surfaces necessitates advanced characterization.
Conventional techniques are limited to spatial wavelengths between 1 µm and 1 mm.

Purpose of the Study:

Extend surface characterization techniques to spatial wavelengths beyond the conventional range.
Evaluate the performance of scanning probe microscopes and long-scan profilers for optical surface analysis.

Main Methods:

Utilized a Nanoscope II atomic force microscope (AFM) for high-resolution surface profiling.
Employed a conventional stylus profiling instrument for comparative analysis.
Characterized a Nanostep long-scan mechanical profiler for long-spatial-wavelength measurements.

Main Results:

Achieved consistent results when comparing AFM and stylus profiling measurements.
Demonstrated the capability of AFM to profile supersmooth optical surfaces with atomic-level resolution.
Showcased long-scan profilers for measuring surface waviness from millimeters to centimeters with enhanced height sensitivity.

Conclusions:

Atomic force microscopy and stylus profiling provide consistent data for optical surface characterization.
Advanced profilers extend measurement capabilities to broader spatial wavelength ranges, crucial for fabricating superior optical surfaces.