Efficient covalent modification of a carbon surface: use of a silyl protecting group to form an active monolayer

Yann R Leroux1, Hui Fei, Jean-Marc Noël

  • 1Sciences Chimiques de Rennes (Equipe MaCSE), CNRS, UMR 6226, Université de Rennes 1, Campus de Beaulieu, Bat 10C, 35042 Rennes Cedex, France.

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