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Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating

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Published on: October 11, 2016

Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography.

G E Sommargren, L G Seppala

|September 22, 2010

Summary

This summary is machine-generated.

This study proposes two condenser designs for soft-x-ray projection lithography, optimizing illumination uniformity and partial coherence for advanced imaging. Simulations confirm their effectiveness in controlling aerial image characteristics.

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Area of Science:

Optics and Photonics
Lithography Technology
Plasma Physics

Background:

Condenser systems are crucial for controlling illumination uniformity and partial coherence in imaging systems.
Soft-x-ray projection lithography presents unique design challenges for condenser systems due to its specific source and imaging requirements.
Achieving precise control over illumination is vital for high-resolution aerial imaging.

Purpose of the Study:

To propose and evaluate novel condenser system designs for soft-x-ray projection lithography.
To address the constraints imposed by ring-field imaging and laser-produced plasma x-ray sources.
To ensure optimal uniformity and partial coherence at the object plane for improved lithography performance.

Main Methods:

Two condenser designs, critical illumination and Köhler illumination, were developed.
Each design utilizes a three-mirror configuration.
Scanning mechanisms were incorporated to cover the entire ring field with desired illumination properties.
Image simulations were performed using Hopkins' formulation for partially coherent imaging.

Main Results:

Both proposed condenser designs enable control over uniformity and partial coherence.
The three-mirror system with scanning effectively covers the ring field.
Simulations demonstrate the impact of condenser design on aerial image characteristics.

Conclusions:

The proposed condenser designs are suitable for soft-x-ray projection lithography.
Effective control of illumination parameters is achievable with the presented optical configurations.
The study provides a foundation for optimizing condenser systems in advanced lithography applications.