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Fabrication of extreme-ultraviolet point-diffraction interferometer aperture arrays.
Applied Optics
|November 10, 2010
Summary
Fabricating specialized apertures for point-diffraction interferometers is crucial for characterizing extreme ultraviolet imaging systems. These apertures enable accurate wave-front aberration analysis, ensuring optimal system performance.
Area of Science:
- Optics and photonics
- Materials science
- Nanotechnology
Background:
- Accurate characterization of imaging systems in the extreme ultraviolet (EUV) requires interferometric testing at the design wavelength.
- Wave-front aberrations significantly impact the performance of EUV imaging systems.
Purpose of the Study:
- To describe the fabrication of point-diffraction interferometer (PDI) apertures for EUV wave-front aberration analysis.
- To enable precise characterization of EUV imaging system performance.
Main Methods:
- Fabrication of PDI apertures using a 200-nm-thick low-pressure chemical-vapor-deposited silicon nitride (Si3N4) film.
- Aperture sizes ranging from 0.10 to 0.50 µm to generate reference wave fronts with varying numerical apertures.
- Application of a graded absorber overcoat to control the intensity of the aberrated wave front.
Main Results:
- Successful fabrication of sub-micrometer PDI apertures in Si3N4 film.
- Demonstrated control over reference wave front numerical aperture through varying aperture sizes.
- Achieved optimal fringe contrast by selecting apertures providing maximum uniformity and contrast.
Conclusions:
- The described fabrication method yields functional PDI apertures for EUV wave-front analysis.
- These apertures are essential for accurate characterization and optimization of EUV imaging systems.
- The selection of appropriate aperture size and absorber properties is critical for obtaining high-quality interferometric data.
