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Fabricating Nanogaps by Nanoskiving
Published on: May 13, 2013
Controlled electroplating and electromigration in nickel electrodes for nanogap formation
Luis De Los Santos Valladares1, Lizbet Leon Felix, Angel Bustamante Dominguez
1Cavendish Laboratory, University of Cambridge, Cambridge, UK. ld301@cam.ac.uk
Nanotechnology
|October 12, 2010
Summary
Researchers fabricated nickel nanospaced electrodes using electroplating and electromigration for nanoelectronic devices. Tunneling current in 1 nm gaps showed magnetic field-dependent asymmetry, indicating orientation-controlled charge transfer.
Area of Science:
- Materials Science
- Nanotechnology
- Electrochemistry
Background:
- Fabrication of nanoelectronic devices requires precise control over electrode dimensions.
- Creating stable nanogaps is a significant challenge in nanoelectronics.
Purpose of the Study:
- To develop a reliable method for fabricating nickel nanospaced electrodes.
- To investigate the electrical transport properties of nanoscale gaps in nickel electrodes.
Main Methods:
- Electrodeposition of nickel electrodes in an electrochemical cell.
- Controlled electromigration to reopen electrode gaps after bridging.
- Tunneling current-voltage characterization of nanogaps (approximately 1 nm).
Main Results:
- Nanogaps were successfully fabricated by controlling electroplating time and parameters.
- Electromigration was used to reopen bridged electrode gaps.
- Tunneling current showed asymmetry in ~1 nm gaps, correctable by an external magnetic field.
Conclusions:
- Nickel nanospaced electrodes can be fabricated using electroplating and electromigration.
- Charge transfer in these nanogaps is sensitive to magnetic field orientation, suggesting spin-dependent transport.
