Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Fabrication of Specimens for Atom Probe Tomography Using a Combined Gallium and Neon Focused Ion Beam Milling Approach.

Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada·2023
Same author

Neon and helium focused ion beam etching of resist patterns.

Nanotechnology·2020
Same author

Defect Localization and Nanofabrication for Conductive Structures with Voltage Contrast in Helium Ion Microscopy.

ACS applied materials & interfaces·2019
Same author

Rapid fabrication of solid-state nanopores with high reproducibility over a large area using a helium ion microscope.

Nanoscale·2018
Same author

Fabrication of nanofluidic biochips with nanochannels for applications in DNA analysis.

Small (Weinheim an der Bergstrasse, Germany)·2012
Same author

Anisotropic wetting surfaces with one-dimensional and directional structures: fabrication approaches, wetting properties and potential applications.

Advanced materials (Deerfield Beach, Fla.)·2012

Related Experiment Video

Updated: Jun 7, 2026

Atomically Traceable Nanostructure Fabrication
12:35

Atomically Traceable Nanostructure Fabrication

Published on: July 17, 2015

Nanostructures and functional materials fabricated by interferometric lithography.

Deying Xia1, Zahyun Ku, S C Lee

  • 1Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.

Advanced Materials (Deerfield Beach, Fla.)
|October 27, 2010
PubMed
Summary
This summary is machine-generated.

Interferometric lithography (IL) creates nanoscale patterns for advanced materials and devices. This review explores IL techniques and applications in nanophotonics, nanofluidics, and materials science.

More Related Videos

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
13:49

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging
07:14

Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging

Published on: April 11, 2025

Related Experiment Videos

Last Updated: Jun 7, 2026

Atomically Traceable Nanostructure Fabrication
12:35

Atomically Traceable Nanostructure Fabrication

Published on: July 17, 2015

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
13:49

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging
07:14

Microfabrication of Implantable Optics Integrated in a Microstructured Imaging Window for Advanced In Vivo Imaging

Published on: April 11, 2025

Area of Science:

  • Nanotechnology
  • Materials Science
  • Optics

Background:

  • Interferometric lithography (IL) is a key technique for fabricating large-area, nanometer-scale periodic patterns.
  • These patterns are formed in photoresist by the nonlinear response to light intensity from coherent beam interference.
  • IL-generated patterns serve as foundational platforms for nanostructure fabrication and functional material growth.

Purpose of the Study:

  • To provide a concise review of Interferometric Lithography (IL) technologies.
  • To highlight diverse applications of IL in creating nanostructures and functional materials.
  • To discuss future prospects and emerging applications of IL.

Main Methods:

  • Utilizing the interference of coherent light beams to create high-resolution periodic patterns.
  • Employing photoresist materials sensitive to light intensity distributions.
  • Reviewing established and emerging IL techniques and their material applications.

Main Results:

  • IL enables the precise definition of nanometer-scale periodic structures over large areas.
  • Applications demonstrated include directed self-assembly of nanoparticles, nanophotonics, semiconductor growth, and nanofluidic devices.
  • IL serves as a versatile platform for advanced material fabrication and device prototyping.

Conclusions:

  • Interferometric lithography is a powerful and versatile technique for nanoscale patterning.
  • IL has broad applications in fields ranging from nanophotonics to nanofluidics and materials science.
  • Future directions promise expanded applications and advancements in IL technology.